High Temperature Reaction Behaviour of Nanoporous Silicon Based Explosive Formulations

  • Authors

    • Henco Bezuidenhout Faculty of Engineering; Chemical Engineering. Cape Peninsula University of Technology
    • Samir Mukhopadhyay Faculty of Engineering; Chemical Engineering. Cape Peninsula University of Technology
    https://doi.org/10.14419/ijbas.v2i4.1369

    Received date: September 27, 2013

    Accepted date: October 24, 2013

    Published date: November 1, 2013

  • Ageing characteristics, density, explosive, high temperature reaction, nanoporous silicon

  • Abstract

    Nanoporous silicon based explosive formulations are currently being explored, with an aim of replacing lead based primary explosives. Nanoporous silicon combines with oxidisers to form energetic mixtures. It is known that the reactivity of such explosive formulations is influenced by the amount and type of oxidiser used in combination with porous silicon. Related studies have shown that, on exposure to ambient air, freshly etched porous silicon becomes progressively oxidised. The shelf life of porous silicon based explosive formulations is influenced by various factors including the level of oxidation of the nanoporous silicon. More resent work, on porous silicon explosive formulations, highlights degradation of the thermal sensitivity of such formulations after a prolonged storage. A new test method has been developed which distinguishes the difference in response characteristics between energetic mixtures. In this study, different oxidisers were used to manufacture nanoporous silicon based explosive formulations. Reported results quantify ageing characteristics and also show the influence of density on the reactivity of nano-porous silicon formulations, when subjected to thermal stimuli.

  • References

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  • How to Cite

    Bezuidenhout, H., & Mukhopadhyay, S. (2013). High Temperature Reaction Behaviour of Nanoporous Silicon Based Explosive Formulations. International Journal of Basic and Applied Sciences, 2(4), 381-386. https://doi.org/10.14419/ijbas.v2i4.1369